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High-purity Gold Target

High density and exceptional film formation uniformity support various custom shapes and backplate bonding services.

High-purity gold targets are precious metal sputtering targets fabricated from ultra-high-purity gold through precision melting, forging, rolling, and mechanical processing. They are primarily used in physical vapor deposition (PVD) magnetron sputtering processes. These targets feature high purity, high density, a smooth surface, and controllable dimensional accuracy, enabling the deposition of uniform, low-defect, and highly conductive gold films for applications in semiconductors, microelectronics, optical devices, and sensors. They are compatible with mainstream sputtering equipment and various coating processes.
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Product Introduction

Product Description

 

These high-purity gold targets are manufactured from ultra-high-purity gold materials and are available in circular, square, rectangular, and custom-shaped specifications, with support for backplate bonding services (indium bonding/elastic body bonding). The products are compatible with most brand sputtering systems, offering excellent film uniformity and stable sputtering rates, making them ideal for high-end thin film deposition applications such as semiconductor electrodes, optical coatings, flexible electronics, and biosensors.

 

 

Features

  • Purity is classified into conventional and ultra-high purity grades
  • High density with uniform tissue structure
  • Exhibits high surface smoothness and excellent machining accuracy
  • For DC sputtering processes
  • The sputtered film exhibits uniform thickness with excellent adhesion
  • It provides a bound backplane component to simplify in-machine installation
  • Compatible with mainstream brand magnetron sputtering equipment

 

Specifications and Models

 

For customizations of diameter, thickness, purity, bonding type, or technical specifications, please feel free to contact us. We can provide tailored material solutions based on your sputtering equipment model, coating requirements, and dimensional specifications.

 

Classification DimensionProduct TypeCore Features
Purity grade

 

High-purity gold targetGeneral-purpose semiconductor and optical coating applications.
Ultra-high purity gold targetSuitable for high-end devices and high-precision coating applications.
Product formatCircular gold targetStandard specifications, suitable for general scenarios.
Square/Rectangular gold targetSuitable for large-area coating and special cavities.

 

 

Product Advantages

 

  • High purity with low impurities
  • High processing accuracy
  • High density, stable sputtering
  • Exhibits excellent film uniformity
  • Comprehensive specification coverage
  • Support bound processing

 

 

Application

 

  • Preparation of Semiconductor Chip Electrodes and Metal Wiring Films
  • Microelectronic devices, MEMS sensor conductive layers
  • Optical devices: reflective films, filter films, infrared coatings
  • Flexible Electronics and Display Devices: Transparent Conductive Layers
  • Biosensors, medical electronic biocompatible films
  • High-end coating technology; thin film deposition in research laboratories

 

 

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