Product Description
This series of platinum targets is fabricated from ultra-high-purity platinum raw materials and is available in circular, rectangular, irregular, and custom sizes. The products are suitable for direct current (DC) sputtering and compatible with mainstream magnetron sputtering equipment, delivering excellent film uniformity and stable adhesion, thereby meeting the stringent requirements for film purity and reliability in advanced manufacturing.
Features
- High purity, conventional grade, available in ultra-high purity specifications
- High surface finish with strict dimensional tolerance control
- The bonded backplane component is available
- Compatible with various standard magnetron sputtering chambers
- High density, uniform tissue structure, reduced sputtering defects and particulate matter
- Exhibits excellent chemical stability with high resistance to oxidation and corrosion
- DC sputtering exhibits stable performance and uniform film formation
Application
- Semiconductor integrated circuit electrodes, barrier layers, and wiring films
- Optoelectronic devices, optical reflective films, filter coatings
- New Energy: Fuel Cells, Solar Cells with Platinum-Based Catalytic Layers
- Automotive sensors, exhaust gas treatment catalytic devices
- Medical implantable devices, biocompatible and corrosion-resistant films
- High-end laboratory research, coating for precision instruments
Customized Service
For customized dimensions, thickness, purity, or technical specifications, please feel free to contact us. We can provide tailored material solutions based on your sputtering equipment, coating requirements, and dimensional specifications.
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